CAM Contact



Center for Advanced Materials



	CAM Facilities

			Thin Film Growth Facilities • Molecular Beam Epitaxy (MBE) and Chemical Beam Epitaxy (CBE) systems (Class 10,000 clean room) • Multiple vacuum evaporation, MOCVD, rf-sputtering and pulsed laser deposition systems • Class 1,000 clean room containing thermal evaporators (2) dedicated to metal deposition, e-beam evaporators (2), barrel etchers/ashers (2), profilometer and wire bonder (with metallurgical microscopes) • Class 10 preparation clean room, mask aligners (2), spinner • Additional processing systems include 2-e-beam deposition system, ion mill, Reaction Ion Etching (RIE) systems (2), Plasma Enhanced Chemical Vapor Deposition (PECVD) system

			Analysis/Characterization Facilities • Hall mobility, I-V and C-V, Tc and Jc, polarization, dielectric constant • Deep Level Transient Spectroscopy (DLTS) • Photoluminescence (PL) spectroscopy systems covering the range of UV to the mid-IR, and temperatures from 2K to 300K. • High-resolution x-ray diffractometer with mapping capabilities for physical characterization of the thin film structures. • Auger Electron Spectrometers (3) and X-ray Photoelectron Spectrometers (2) • Scanning Electron Microscope (SEM) with Energy Dispersive Spectroscopy (EDS), and AFM/I-AFM/Scanning Kelvin Probe AFM • Center Materials Characterization Facility provides technical support in TEM, SEM, scanning probe microscopies, XPS, SIMS, microprobe analysis, X-raydiffraction, RBS, and nuclear reaction analysis to study transport, optical, and magnetic properties



		Center for Advanced Materials
		724 Science & Research Building One
		Houston, Texas 77204-5004
		713-743-3621